Fabrication of sawtooth diffraction gratings using nanoimprint lithography
نویسندگان
چکیده
We report a process which integrates interference lithography, nanoimprint lithography, and anisotropic etching to fabricate replicated diffraction gratings with sawtooth profiles. This new process greatly reduces grating fabrication time and cost, while preserving the groove shape and smoothness. Relief gratings with 400 nm period inverted triangular profiles and 200 nm period gratings with 7° blaze angle were replicated from silicon masters with surface roughness of less than 1 nm. This process was developed for fabricating the off-plane blazed diffraction gratings for the NASA Constellation-X x-ray telescope. © 2003 American Vacuum Society. @DOI: 10.1116/1.1627814#
منابع مشابه
Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography
We demonstrated the fabrication of Fresnel zone plates with a 75 nm minimum feature size and circular gratings with a 20 nm minimum linewidth in polymethyl methacrylate using nanoimprint lithography, and in metals by means of a lift-off technique. Observation of sharp Moiré patterns indicated the high fidelity of nanoimprint lithography in pattern duplication. Our results showed that nanoimprin...
متن کاملFabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography
Line edge roughness is an important factor contributing to the problem of performance degradation in various nanoscale devices. We have developed two smoothing techniques based on nanoimprint lithography for the fabrication of nanoscale gratings with significantly reduced line edge roughness. Compared with other smoothing techniques reported before, our methods are low-cost, effective, and easy...
متن کاملNanoimprinted Tio2 sol–gel passivating diffraction gratings for solar cell applications
We report the fabrication and characterization of TiO2 sol–gel diffraction gratings on silicon substrates by using nanoimprint lithography. The gratings are homogeneous and free of defects and cover an area of 25 cm. Minority carrier lifetimes of up to 900 μs for imprinted samples under illumination are reported, which Kelvin probe measurements indicate is due to light‐generated negative charge...
متن کاملControlled angular redirection of light via nanoimprinted disordered gratings.
Enhanced control of diffraction through transparent substrates is achieved via disordered gratings in a silica sol-gel film. Tailoring the degree of disorder allows tuning of the diffractive behavior from discrete orders into broad distributions over large angular range. Gratings of optical quality are formed by silica sol-gel nanoimprint lithography and an optical setup for the measurement of ...
متن کاملFabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications
In this article we report on the fabrication of 100 nm pitch gratings over a large area ~;10 cm! using a simple, low-cost, fast process. This method includes ~1! generation of the grating pattern using interferometric lithography and spatial frequency doubling and ~2! pattern replication using nanoimprint lithography. The form birefringence of a 100 nm pitch Si grating was studied using ellipso...
متن کامل